Ag ALLOY REFLECTIVE FILM FOR REFLECTOR, REFLECTOR, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTIVE FILM FOR REFLECTOR

WIPO Patent Application WO/2008/018298

A1

Disclosed are: an Ag alloy reflective film for use in the formation of a reflector which has a high reflectivity and hardly causes the coagulation of Ag by humidity or heat; a reflector; and an Ag alloy sputtering target for use in the formation of an Ag alloy reflective film for a reflector. (1) Disclosed is an Ag alloy reflective film for a reflector, which comprises Ag as the main ingredient and one or more members selected from Ti, V, Cr, Mn, Mg and W in a total amount of more than 3 atm% and not more than 7 atm%. (2) The Ag alloy reflective film may contain one or more members selected from Au, Pt, Pd and Cu in a total amount of 0.3 to 2 atm%. (3) The Ag alloy reflective film may have a reflectivity as measured with light having a wavelength of 650 nm of 85% or greater. (4) The Ag alloy reflective film may be formed by a sputtering process. (5) Also disclosed is a reflector having the Ag alloy reflective film. (6) Further disclosed is a target for use in the formation of an Ag alloy reflective film.

SUZUKI JUN
SATO TOSHIKI
KAWANAKA TAKAO

PCT/JP2007/064653

February 14, 2008

July 26, 2007

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KOBE STEEL LTD (JP)
SUZUKI JUN
SATO TOSHIKI
KAWANAKA TAKAO

G02B5/08; C23C14/14; C23C14/34

JP2001226765A	2001-08-21
JP2002129314A	2002-05-09
JP2002226927A	2002-08-14
JPH1152366A	1999-02-26
JP2004272245A	2004-09-30

OGURI, Shohei et al. (7-13 Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, JP)

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