Title:
ALD PROCESSING DEVICE AND PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/116339
Kind Code:
A1
Abstract:
The present disclosure relates to an ALD processing device and a processing method. A reactor of the processing device comprises a vacuum chamber and a reaction chamber, the reaction chamber is provided within the vacuum chamber, the top of the reaction chamber is open, the bottom of the reaction chamber is provided with an air inlet channel and an air outlet channel, and the air inlet channel and the air outlet channel are provided opposite each other along a central line in a first direction of the bottom of the reaction chamber. A lifting device is provided on the reactor, an output end of the lifting device is extendable and retractable in a vertical direction, the output end of the lifting device is provided with a sealing cover, and the sealing cover operably seals the top of the reaction chamber. A conveying device is used for conveying a substrate into the vacuum chamber. A grasping device is provided on the sealing cover, and the grasping device is used for grasping the substrate conveyed into the vacuum chamber. The present disclosure ensures the formation quality and consistency of a deposited film, has a high film forming efficiency and a short cycle, improves the utilization rate of a precursor source, is suitable for mass production, and has a good practical value.
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Inventors:
WAN JUN (CN)
LIAO HAITAO (CN)
WANG BIN (CN)
WANG HUI (CN)
LIAO HAITAO (CN)
WANG BIN (CN)
WANG HUI (CN)
Application Number:
PCT/CN2020/141154
Publication Date:
June 09, 2022
Filing Date:
December 30, 2020
Export Citation:
Assignee:
ADVANCED MATERIALS TECH & ENGINEERING INC (CN)
International Classes:
C23C16/52; C23C16/455; C23C16/54
Foreign References:
| CN109689930A | 2019-04-26 | |||
| KR101055064B1 | 2011-08-05 | |||
| US20150059981A1 | 2015-03-05 | |||
| CN210030882U | 2020-02-07 |
Attorney, Agent or Firm:
BEIJING ZHONGDA DEQUAN IP AGENCY CO., LTD. (CN)
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