Title:
THE ANTI-REFLECTION STRUCTURE AND THE USER'S EQUIPMENT COMPRISING THE SAME
Document Type and Number:
WIPO Patent Application WO/2022/133773
Kind Code:
A1
Abstract:
The present disclosure relates to the anti-reflection structure for millimeter wave application and the user's equipment comprising the same. The anti-reflection structure of the present disclosure includes the comprises at least one antireflection film with a specific thickness, permittivity (Dk), a permeability (Uk) of 1 to 2, and a dissipation factor (Df) of 0 to 0.1. According to the anti-reflection structure, it has advantageous transmittance and reflectance in a bandwidth with a frequency of 20-45 GHz
Inventors:
LIN WEIGANG (CN)
DING MIN (CN)
FLORCZAK JEFFREY M (US)
HUANG JIE (CN)
DEHN DEREK JASON (US)
XU JIARU (CN)
WANG KUN (CN)
LI WEI (CN)
GHOSH DIPANKAR (US)
DING MIN (CN)
FLORCZAK JEFFREY M (US)
HUANG JIE (CN)
DEHN DEREK JASON (US)
XU JIARU (CN)
WANG KUN (CN)
LI WEI (CN)
GHOSH DIPANKAR (US)
Application Number:
PCT/CN2020/138517
Publication Date:
June 30, 2022
Filing Date:
December 23, 2020
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES CO (US)
LIN WEIGANG (CN)
LIN WEIGANG (CN)
International Classes:
H01F1/34; C04B35/26; H01F41/00; H05K9/00
Foreign References:
| CN107564656A | 2018-01-09 | |||
| CN111547729A | 2020-08-18 | |||
| CN103011792A | 2013-04-03 | |||
| US20150073072A1 | 2015-03-12 |
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW (CN)
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