Title:
APPARATUS AND METHOD FOR CLEANING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2023/219219
Kind Code:
A1
Abstract:
According to an aspect of an embodiment, provided is an apparatus for cleaning a substrate, the apparatus comprising: a cleaning tank containing a plurality of substrates and a cleaning solution; a megasonic that is provided below the cleaning tank and emits ultrasonic waves toward the substrates during a cleaning time (t); first and second side arms disposed on either side of the inside of the cleaning tank; a plurality of first and second side combs provided below the first and second side arms and supporting either side of the lower part of the substrates; a center arm disposed in the center of the inside of the cleaning tank; a plurality of center combs provided below the center arm and supporting the center of the lower part of the substrates; and a driving unit for moving up and down or swinging the center arm relative to the center of the substrate during the cleaning time (t).
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Inventors:
CHOI EUNSUCK (KR)
Application Number:
PCT/KR2022/019696
Publication Date:
November 16, 2023
Filing Date:
December 06, 2022
Export Citation:
Assignee:
SK SILTRON CO LTD (KR)
International Classes:
H01L21/67; B08B3/06; B08B3/12; H01L21/677; H01L21/687
Foreign References:
| KR20150082303A | 2015-07-15 | |||
| JP2011204893A | 2011-10-13 | |||
| JP5696491B2 | 2015-04-08 | |||
| KR20190049475A | 2019-05-09 | |||
| KR20100034091A | 2010-04-01 |
Attorney, Agent or Firm:
HAW, Yong Noke (KR)
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