Title:
APPLICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/146241
Kind Code:
A1
Abstract:
A first chemical fluid C1 is placed in a spiral shape without gaps on a solvent film SL on a substrate W. Rotation of the circular substrate W spreads out each of the first chemical fluid C1 and a second chemical fluid C2. The first chemical fluid C1 pulls the second chemical fluid C2, which has a higher viscosity than the first chemical fluid C1, and thus assists in spreading the second chemical fluid C2. The second chemical fluid C2 is placed on top of the first chemical fluid C1, which has a lower viscosity than the second chemical fluid C2, and the solvent SL is in a recessed part H formed on the surface of the circular substrate W. Accordingly, the first chemical fluid C1 can more easily be made to enter the recessed part H by the rotation of the circular substrate W than the second chemical fluid C2.
Inventors:
YOSHIDA SHOGO (JP)
Application Number:
PCT/JP2018/043586
Publication Date:
August 01, 2019
Filing Date:
November 27, 2018
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
B05D1/36; B05D1/40; B05D3/00; B05D7/00
Domestic Patent References:
| WO2018008325A1 | 2018-01-11 |
Foreign References:
| JP2002299199A | 2002-10-11 | |||
| JPS547873A | 1979-01-20 | |||
| JP2002361156A | 2002-12-17 | |||
| JP2000051770A | 2000-02-22 | |||
| JP2000350955A | 2000-12-19 | |||
| JP2018183714A | 2018-11-22 |
Attorney, Agent or Firm:
SUGITANI Tsutomu (JP)
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