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Title:
APPLICATOR
Document Type and Number:
WIPO Patent Application WO/2015/115420
Kind Code:
A1
Abstract:
　This applicator is provided with a support surface for supporting a sloped micro-needle, and a rotation mechanism for rotating the support surface in the direction of the distal end of the micro-needle along the longitudinal direction in which the micro-needle is to puncture skin, the rotation mechanism being limited in movement range.

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Inventors:
FUDOJI RYUSUKE (JP)
OGURA MAKOTO (JP)
Application Number:
PCT/JP2015/052176
Publication Date:
August 06, 2015
Filing Date:
January 27, 2015
Export Citation:
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Assignee:
HISAMITSU PHARMACEUTICAL CO (JP)
International Classes:
A61M37/00
Foreign References:
JP2007511318A2007-05-10
JP2012518171A2012-08-09
JP2004501726A2004-01-22
JP2012024240A2012-02-09
JP2013215621A2013-10-24
JP2007532245A2007-11-15
KR20100085571A2010-07-29
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)
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