ARTICLE HAVING PROTRUSION/RECESS STRUCTURE, AND METHOD FOR PRODUCING SAME

WIPO Patent Application WO/2016/017810

A1

One embodiment of the present invention relates to a method for producing an article having a protrusion/recess structure, and to an article having a protrusion/recess structure, said method including the feature of forming a protrusion/recess structure, in which an exposed portion that has been exposed by means of pattern exposure constitutes a protrusion, by: forming a laminate having a first layer that includes at least a polymerizable compound and a photopolymerization initiator and having a second layer that is a resin-containing layer adjacent to the first layer (in the event that the second layer includes a polymerizable compound, the concentration of the polymerizable compound in the second layer is lower than the concentration of the polymerizable compound in the first layer); subjecting the surface of the first layer of the laminate to pattern exposure; and heating the laminate that has been subjected to pattern exposure.

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FUKUSHIGE YUUICHI (JP)
NAMIKAWA HITOSHI (JP)
SANETO RYUJI (JP)
WATANABE KENTA (JP)
TAKAHASHI YOHEI (JP)

PCT/JP2015/071842

February 04, 2016

July 31, 2015

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FUJIFILM CORP (JP)

B29C59/18; B29C41/22; C08J7/00; G03F7/20

JP2008287234A	2008-11-27
JPS5340054A	1978-04-12

SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)

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