Title:
BAKING DEVICE AND BAKING METHOD FOR CYLINDRICAL SPUTTERING TARGET MATERIAL
Document Type and Number:
WIPO Patent Application WO/2017/195311
Kind Code:
A1
Abstract:
[Problem] The present invention addresses the problem of providing a baking device for manufacturing an elongated cylindrical sputtering target which is used to manufacture, via sputtering, a transparent conductive film used in a liquid crystal display device, a solar cell, and the like. [Solution] The present invention is characterized by being provided with: a fixed hearth where a member to be baked of the elongated cylindrical sputtering target material is placed upright; a baking furnace body centered around the fixed hearth and having on furnace walls a plurality of heaters and an oxygen inflow port; and a mechanism whereby the baking furnace body is placed on a traveling truck and can travel by rail between a baking position and a standby position, the mechanism further opening and closing a furnace seal between the bottom of the baking furnace and the fixed hearth.
Inventors:
KUBOTA YOSHIAKI (JP)
MORIOKA TOSHIHIRO (JP)
MORIOKA TOSHIHIRO (JP)
Application Number:
PCT/JP2016/064097
Publication Date:
November 16, 2017
Filing Date:
May 12, 2016
Export Citation:
Assignee:
HIROCHIKU CO LTD (JP)
International Classes:
C23C14/34
Foreign References:
| JPS62222004A | 1987-09-30 | |||
| JP2012126587A | 2012-07-05 | |||
| JP2008120653A | 2008-05-29 | |||
| JP2000086352A | 2000-03-28 | |||
| JP2008184337A | 2008-08-14 |
Attorney, Agent or Firm:
AKETA Kan et al. (JP)
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