Title:
BLOCK COPOLYMER, MICROPHASE SEPARATION STRUCTURE MEMBRANE, AND METHOD FOR PRODUCING MICROPHASE SEPARATION STRUCTURE MEMBRANE
Document Type and Number:
WIPO Patent Application WO/2014/199931
Kind Code:
A1
Abstract:
In this block copolymer, a polymer component (A) containing an alkylene chain having 2-20 carbon atoms and a polymer component (B) containing an alkylene oxide chain are covalently bonded in a direct manner or with a linking group therebetween, the polymer component (A) has a mesogenic side chain having 6-50 carbon atoms, and at least one terminal of the primary chain has a group represented by the belowmentioned formula (where R1 to R3 each independently represent an aryl group, an alkyl group, or a heteroaryl group). The block copolymer has a low metal content, has superior light storage stability, can be formed via living polymerization either in batches or by means of microreactors, and can form a favorable microphase separation structure membrane in an economically rational manner.
Inventors:
TAKAHASHI KEITA (JP)
TAKADA YOSHIAKI (JP)
WADA KENJI (JP)
TAKADA YOSHIAKI (JP)
WADA KENJI (JP)
Application Number:
PCT/JP2014/065179
Publication Date:
December 18, 2014
Filing Date:
June 09, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F297/02; C08F20/12; C08G81/02
Domestic Patent References:
| WO2012001945A1 | 2012-01-05 | |||
| WO2007132901A1 | 2007-11-22 |
Foreign References:
| JP2004124088A | 2004-04-22 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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