BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTAINING STYRENE STRUCTURE

WIPO Patent Application WO/2014/098025

A1

[Problem] To provide a bottom layer film-forming composition used in the bottom layer of a self-organizing film. [Solution] This bottom layer film-forming composition of a self-organizing film contains a polymer that consists of a unit structure derived from an optionally substituted styrene and a unit structure derived from a compound containing a cross-link-forming group, there being 60-95 mol% of the unit structure derived from styrene and 5-40 mol% of the unit structure derived from the compound containing a cross-link-forming group with respect to all the unit structures of the polymer. The cross-link-forming group is a hydroxyl group, an epoxy group, a protected hydroxyl group, or a protected carboxyl group. The compound containing a cross-link-forming group is hydroxyethyl methacrylate, hydroxyethyl acrylate, hydroxypropyl methacrylate, hydroxypropyl acrylate, hydroxylstyrene, acrylic acid, methacrylic acid, glycidyl methacrylate, or glycidyl acrylate.

SOMEYA YASUNOBU (JP)
WAKAYAMA HIROYUKI (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)

PCT/JP2013/083602

June 26, 2014

December 16, 2013

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NISSAN CHEMICAL IND LTD (JP)

C08L25/04; C08F12/08; C08K5/3447; C09D125/08; G03F7/38; H01L21/027

WO2012111694A1	2012-08-23
WO2008015969A1	2008-02-07
WO2012046770A1	2012-04-12

JP2012062365A	2012-03-29
JP2013212489A	2013-10-17
JP2013189571A	2013-09-26
JP2013216859A	2013-10-24
JP2012078828A	2012-04-19
JP2012078830A	2012-04-19
JP2011122081A	2011-06-23
JP2013166934A	2013-08-29
JP2011122081A	2011-06-23
JP2012078828A	2012-04-19
JP2012078830A	2012-04-19

See also references of EP 2937385A4

HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)

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