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Title:
BUFFER DEVICE SUITABLE FOR HIGH-VISCOSITY PHOTORESIST, AND PHOTORESIST LIQUID SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/066800
Kind Code:
A1
Abstract:
A buffer device suitable for a high-viscosity photoresist, and a photoresist liquid supply system. The buffer device comprises a liquid storage tank (1), and a liquid intake pipe (101) and a liquid output pipe (102), which are in communication with the liquid storage tank (1). The liquid storage tank (1) comprises a bottom wall (11) and side walls (12). The buffer device further comprises a guide plate (14) arranged in the liquid storage tank (1), wherein the guide plate (14) is obliquely arranged; the liquid intake pipe (101) extends to a position below the guide plate (14) from top to bottom; and a vent hole (141) is formed in the guide plate (14). The buffer device can reduce bubbles, thereby improving the uniform stability of a photoresist coating operation, and facilitating the production of semiconductors.

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Inventors:
GUO ZHEN (CN)
Application Number:
PCT/CN2023/114004
Publication Date:
April 04, 2024
Filing Date:
August 21, 2023
Export Citation:
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Assignee:
CHIPMORE TECH CORPORATION LIMITED (CN)
HEFEI CHIPMORE TECH CO LTD (CN)
International Classes:
B05C11/10
Foreign References:
CN115502052A2022-12-23
CN208796027U2019-04-26
CN209689377U2019-11-26
CN114488697A2022-05-13
CN108975257A2018-12-11
CN114669447A2022-06-28
JPH1074742A1998-03-17
KR20020074835A2002-10-04
TW497168B2002-08-01
Attorney, Agent or Firm:
SUZHOU WISPRO INTELLECTUAL PROPERTY AGENCY (CN)
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