Title:
CALCIUM HYDROXIDE SLURRY FOR CHEMICAL HEAT STORAGE MATERIAL, METHOD FOR PRODUCING CALCIUM HYDROXIDE SLURRY FOR CHEMICAL HEAT STORAGE MATERIAL, CHEMICAL HEAT STORAGE MATERIAL, METHOD FOR PRODUCING CHEMICAL HEAT STORAGE MATERIAL, AND METHOD FOR PERFORMING CHEMICAL HEAT STORAGE
Document Type and Number:
WIPO Patent Application WO/2023/149361
Kind Code:
A1
Abstract:
The purpose of the present invention is: to provide a calcium hydroxide slurry for chemical heat storage that has a high concentration and a suitable viscosity and that can be supported on a supporting base material such as a heat exchanger base material, and a method for producing the calcium hydroxide slurry for chemical heat storage; to provide a chemical heat storage material in which calcium hydroxide is supported on a supporting base material, and a method for producing the chemical heat storage material; and to provide a method for performing chemical heat storage in the chemical heat storage material. The present invention relates to a calcium hydroxide slurry used in a chemical heat storage material in which the calcium hydroxide solids concentration is 50 wt% or greater and the viscosity is 5,000 mPa∙s or less, and a method for producing the calcium hydroxide slurry, and additionally relates to a chemical heat storage material in which calcium hydroxide having a BET specific surface area of 7-30 m2/g and a volume-based average particle size (D50) of 5-20 μm according to laser diffraction particle size measurement is supported on a supporting base material, a method for producing the chemical heat storage material, and a method for performing chemical heat storage.
Inventors:
TAJIKA MASAHIKO (JP)
ABE YUKA (JP)
MATSUBARA KEI (JP)
KATO YUKITAKA (JP)
FUNAYAMA SHIGEHIKO (JP)
KATO TAKASHI (JP)
TAMANO SOICHIRO (JP)
TAKASU HIROKI (JP)
ABE YUKA (JP)
MATSUBARA KEI (JP)
KATO YUKITAKA (JP)
FUNAYAMA SHIGEHIKO (JP)
KATO TAKASHI (JP)
TAMANO SOICHIRO (JP)
TAKASU HIROKI (JP)
Application Number:
PCT/JP2023/002559
Publication Date:
August 10, 2023
Filing Date:
January 27, 2023
Export Citation:
Assignee:
SHIRAISHI CENTRAL LABORATORIES CO LTD (JP)
TOKYO INST TECH (JP)
TOKYO INST TECH (JP)
International Classes:
C09K5/16; F28D20/00
Foreign References:
| CN102732231A | 2012-10-17 | |||
| US4054126A | 1977-10-18 | |||
| JP2016102137A | 2016-06-02 | |||
| JP2011162746A | 2011-08-25 | |||
| JP2009221289A | 2009-10-01 | |||
| CN105423791A | 2016-03-23 | |||
| CN102757771A | 2012-10-31 |
Attorney, Agent or Firm:
GLOBAL IP TOKYO (JP)
Download PDF: