CERAMIC COATING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS

Title:

CERAMIC COATING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2007/108546

Kind Code:

A1

Abstract:

A ceramic coating member is provided for improving durability of a member arranged inside a container of a semiconductor processing apparatus for performing plasma etching process or the like under strong corrosion resistant environment. A porous layer composed of a sprayed coating of an oxide material in the group IIIa in the periodic table is provided on the front plane of a metal or nonmetal base material, directly or through an undercoat layer. On the layer, a secondary recrystallized layer is formed by irradiation of high energy of electronic beams, laser beams and the like.

Inventors:

KOBAYASHI YOSHIYUKI (JP)
MURAKAMI TAKAHIRO (JP)
HARADA YOSHIO (JP)
TAKEUCHI JUNICHI (JP)
YAMASAKI RYO (JP)
KOBAYASHI KEIGO (JP)

Application Number:

PCT/JP2007/056116

Publication Date:

September 27, 2007

Filing Date:

March 16, 2007

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)
TOCALO CO LTD (JP)
KOBAYASHI YOSHIYUKI (JP)
MURAKAMI TAKAHIRO (JP)
HARADA YOSHIO (JP)
TAKEUCHI JUNICHI (JP)
YAMASAKI RYO (JP)
KOBAYASHI KEIGO (JP)

International Classes:

C23C28/00; C23C4/10; C23C4/18; C23C26/00; C23C28/04; H01L21/304; H01L21/3065

Foreign References:

JP2005256098A	2005-09-22
JP2001164354A	2001-06-19
JPS62253758A	1987-11-05
JPH04276059A	1992-10-01
JPS58192661A	1983-11-10
JP2002080954A	2002-03-22

Attorney, Agent or Firm:

OGAWA, Junzo et al. (8-9 Ginza 2-chom, Chuo-ku Tokyo 61, JP)

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