Title:
CERIUM-BASED ABRASIVE MATERIAL, POLISHING LIQUID, POLISHING LIQUID PRODUCTION METHOD, AND GLASS POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/014425
Kind Code:
A1
Abstract:
A cerium-based abrasive material containing composite rare earth abrasive material particles that contain lanthanum and cerium, wherein the cerium oxide content is at least 55.0 mass% of the total rare earth oxide (TREO) content, and the amount of dissolved lanthanum in a liquid mixture obtained by inserting 10 g of the cerium-based abrasive material and 40 g of pure water, as slurry components, and 130 g of zirconia beads having a particle diameter of 1 mm, as beads, into a 100 mL polyethylene container subjecting the cerium-based polishing material to a pulverization treatment for 30 minutes with a container rotation speed of 210 rpm using a ball mill stand is 40 mg/L or less.
Inventors:
YAMANO HIROSHI (JP)
MASUDA TOMOYUKI (JP)
FUKAYAMA MASAKI (JP)
MASUDA TOMOYUKI (JP)
FUKAYAMA MASAKI (JP)
Application Number:
PCT/JP2023/025421
Publication Date:
January 18, 2024
Filing Date:
July 10, 2023
Export Citation:
Assignee:
RESONAC CORP (JP)
International Classes:
C01F17/241; C09K3/14; C09G1/02
Domestic Patent References:
| WO2017051629A1 | 2017-03-30 | |||
| WO2002031079A1 | 2002-04-18 | |||
| WO2019049932A1 | 2019-03-14 |
Foreign References:
| JP2012219006A | 2012-11-12 | |||
| JP2012524129A | 2012-10-11 | |||
| JPS6035075A | 1985-02-22 |
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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