Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/183551
Kind Code:
A1
Abstract:
Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
Inventors:
LI WEN (JP)
KAWANO HAJIME (JP)
ENYAMA MOMOYO (JP)
SAKAKIBARA MAKOTO (JP)
KAWANO HAJIME (JP)
ENYAMA MOMOYO (JP)
SAKAKIBARA MAKOTO (JP)
Application Number:
PCT/JP2019/009527
Publication Date:
September 17, 2020
Filing Date:
March 08, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/153; H01J37/05
Foreign References:
JP2004342341A | 2004-12-02 | |||
JP2018029089A | 2018-02-22 | |||
JPS57147856A | 1982-09-11 |
Attorney, Agent or Firm:
SEIRYO I.P.C. (JP)
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