Title:
CHARGED PARTICLE BEAM DRAWING DEVICE, CHARGED PARTICLE BEAM DRAWING METHOD, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2021/157301
Kind Code:
A1
Abstract:
According to the present invention, the difference between the calculated value of a drift amount and the actual drift amount is reduced. The charged particle beam drawing device according to one aspect of the present invention comprises: a deflector that adjusts the irradiation position of the charged particle beams with respect to a substrate placed on a stage; a shot data generation unit that generates shot data from drawing data, the shot data including shot position and beam on/off time for each shot; a drift correction unit that refers to the plurality of generated shot data, calculates the drift amount of the irradiation position of the charged particle beam with which the substrate is irradiated, and generates correction information for correcting irradiation position skew on the basis of the drift amount; a deflection control unit that controls the deflection amount achieved by the deflector on the basis of the shot data and the correction information; and a dummy irradiation instruction unit that, during drawing processing, instructs execution of dummy irradiation for irradiating a position different from that of the substrate on the stage with the charged particle beams at a predetermined irradiation amount.
Inventors:
YAMADA TAKU (JP)
Application Number:
PCT/JP2021/000838
Publication Date:
August 12, 2021
Filing Date:
January 13, 2021
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/305; H01L21/027
Domestic Patent References:
| WO2020026696A1 | 2020-02-06 |
Foreign References:
| JP2001006992A | 2001-01-12 | |||
| JPS6085519A | 1985-05-15 | |||
| JP2010267909A | 2010-11-25 | |||
| JPH05304080A | 1993-11-16 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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