Title:
CLEAN ROOM SYSTEM FOR SEMICONDUCTOR MANUFACTURING AND ELECTRIC FIELD DUST REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/216359
Kind Code:
A1
Abstract:
A clean room system for semiconductor manufacturing and an electric field dust removal method therefor. The clean room system (100) comprises a clean room (101) and an electric field dust removal system (102); the clean room (101) comprises a gas inlet; the electric field dust removal system (102) comprises a dust removal system outlet and an electric field device (1021); the gas inlet of the clean room (101) is in communication with the dust removal system outlet of the electric field dust removal system (102); the electric field device (1021) comprises an electric field device inlet (1011), an electric field device outlet, an electric field cathode (10142), and an electric field anode (10141), the electric field cathode (10142) and the electric field anode (10141) being used for generating an ionizing electric field. The clean room system and the electric field dust removal method therefor can effectively remove particles generated in the semiconductor manufacturing industry.
Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086854
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
F24F3/16
Foreign References:
| JP2627575B2 | 1997-07-09 | |||
| CN106504994A | 2017-03-15 | |||
| CN101920224A | 2010-12-22 | |||
| CN109643681A | 2019-04-16 | |||
| DE3310536A1 | 1984-09-27 | |||
| JP3460465B2 | 2003-10-27 |
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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