Title:
CLEAN ROOM SYSTEM FOR SEMICONDUCTOR MANUFACTURE AND ELECTRIC FIELD DUST REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/216358
Kind Code:
A1
Abstract:
Provided are a clean room system (100) for semiconductor manufacture and an electric field dust removal method therefor. The clean room system (100) comprises a clean room (101) and an electric field dust removal system (102). The clean room (101) comprises a gas inlet; and the electric field dust removal system (102) comprises a dust removal system outlet and an electric field device (1021). The gas inlet of the clean room (101) is connected to the dust removal system outlet of the electric field dust removal system (102). Electric field cathodes (10142, 4052, 5081, 3081) and electric field anodes (10141, 4051, 5082, 3082) of the electric field device (1021) are used for generating ionizing electric fields.
Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086853
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
B03C3/011; B03C3/06; B03C3/34; B03C3/41; B03C3/47; B03C3/49
Foreign References:
| JPS57150457A | 1982-09-17 | |||
| CN106733194A | 2017-05-31 | |||
| CN203108663U | 2013-08-07 | |||
| CN205518205U | 2016-08-31 | |||
| CN206980986U | 2018-02-09 | |||
| JPH028638A | 1990-01-12 |
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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