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Title:
CLEANING AGENT FOR GALLIUM OXIDE SUBSTRATES
Document Type and Number:
WIPO Patent Application WO/2022/070969
Kind Code:
A1
Abstract:
The present invention provides a cleaning agent which exhibits an exceptional cleaning effect for polished gallium oxide substrates. Provided is a cleaning agent for cleaning polished gallium oxide substrates. This cleaning agent contains a surfactant.

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Inventors:
HIRAKO SACHIKO (JP)
NOGUCHI NAOTO (JP)
Application Number:
PCT/JP2021/034212
Publication Date:
April 07, 2022
Filing Date:
September 17, 2021
Export Citation:
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Assignee:
FUJIMI INC (JP)
International Classes:
C11D1/02; B24B55/06; C11D1/38; C11D1/66; C11D1/88; H01L21/304
Domestic Patent References:
WO2014077370A12014-05-22
Foreign References:
JP2008105883A2008-05-08
JP2014526153A2014-10-02
JP2008537343A2008-09-11
JP2012074678A2012-04-12
JP2010171362A2010-08-05
JP2009124170A2009-06-04
JP2019117959A2019-07-18
Attorney, Agent or Firm:
ABE, Makoto (JP)
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