Title:
CLEANING LIQUID, CLEANING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER
Document Type and Number:
WIPO Patent Application WO/2020/045414
Kind Code:
A1
Abstract:
The present invention relates to a cleaning liquid which contains a compound represented by general formula (1) (component (A)), an alkyl amine (component (B)), a polycarboxylic acid (component (C)) and ascorbic acid (component (D)), and which is configured such that the mass ratio of the component (A) to the total mass of the component (B) and the component (C) is 1-15. (In general formula (1), R1, R2 and R3 are as defined in the description.)
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Inventors:
SHIBATA TOSHIAKI (JP)
KAWASE YASUHIRO (JP)
HARADA KEN (JP)
ITO ATSUSHI (JP)
KUSANO TOMOHIRO (JP)
TAKESHITA YUTARO (JP)
KAWASE YASUHIRO (JP)
HARADA KEN (JP)
ITO ATSUSHI (JP)
KUSANO TOMOHIRO (JP)
TAKESHITA YUTARO (JP)
Application Number:
PCT/JP2019/033484
Publication Date:
March 05, 2020
Filing Date:
August 27, 2019
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
H01L21/304; C11D7/22; C11D7/26; C11D7/32; C11D17/08
Domestic Patent References:
| WO2010104816A1 | 2010-09-16 |
Foreign References:
| JP2015203047A | 2015-11-16 | |||
| JP2015165562A | 2015-09-17 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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