Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/029900
Kind Code:
A1
Abstract:
A substrate treatment method including: a substrate holding step in which a substrate is held horizontally; a liquid film-formation step in which a treatment liquid is supplied to the upper surface of the substrate and a liquid film of the treatment liquid is formed that covers the upper surface of the substrate; a vapor atmosphere filling step in which a vapor atmosphere including vapor of a low surface tension liquid having a lower surface tension than the treatment liquid is filled around the liquid film of treatment liquid; a thin-film area formation step in which, in parallel with the vapor atmosphere filling step, a thin-film area is formed on the liquid film of treatment liquid by rotating the substrate at a prescribed thin-film area formation speed and partially removing the treatment liquid, without blowing gas on to the substrate; a thin-film area expansion step in which, in parallel with the vapor atmosphere filling step, the thin-film area is expanded towards the outer perimeter of the substrate; and a thin-film removal step in which, after the thin film is expanded over the entire upper surface in the thin-film area expansion step, the thin film is removed from the upper surface.

More Like This:
JPWO2004075276Polishing equipment, polishing methods and manufacturing methods of semiconductor devices
JP2022054189SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
JP3823308POLISHING DEVICE OF SEMICONDUCTOR DEVICE
Inventors:
OTSUJI MASAYUKI (JP)
Application Number:
PCT/JP2016/069932
Publication Date:
February 23, 2017
Filing Date:
July 05, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
JP2004128495A2004-04-22
JPH11145099A1999-05-28
JP2008034455A2008-02-14
JP2007158270A2007-06-21
JP2008034612A2008-02-14
JP2009238793A2009-10-15
Attorney, Agent or Firm:
INAOKA, Kosaku et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: ORIENTED POSITIVE ELECTRODE PLATE FOR LITHIUM SECONDARY BATTERY

Next Patent: IMAGING DEVICE AND IMAGING APPARATUS