Title:
CLEANING LIQUID FOR REMOVING CERIUM COMPOUNDS, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER
Document Type and Number:
WIPO Patent Application WO/2021/111914
Kind Code:
A1
Abstract:
The present invention pertains to a cleaning liquid for removing cerium compounds on a silicon oxide film and/or a silicon nitride film, the cleaning liquid containing: a component (A) that is at least one compound selected from the group consisting of compounds represented by formula (1) and derivatives thereof, compounds represented by formula (2) and derivatives thereof, compounds represented by formula (3) and derivatives thereof, and compounds represented by formula (4) and derivatives thereof; and a component (B) that is a reducing agent. (In the formulas, R1-R12 and n are each as defined in the specification.)
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Inventors:
AN LONGJIE (JP)
KUSANO TOMOHIRO (JP)
ONO YUKAKO (JP)
TAKESHITA KAN (JP)
KIYONO KENICHI (JP)
KUSANO TOMOHIRO (JP)
ONO YUKAKO (JP)
TAKESHITA KAN (JP)
KIYONO KENICHI (JP)
Application Number:
PCT/JP2020/043512
Publication Date:
June 10, 2021
Filing Date:
November 20, 2020
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
C11D17/08; C11D7/22; C11D7/26; C11D7/36; H01L21/304
Foreign References:
| JP2010163608A | 2010-07-29 | |||
| JP2004022986A | 2004-01-22 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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