Title:
COATING METHOD FOR REDUCING DAMAGE TO BARRIER LAYER
Document Type and Number:
WIPO Patent Application WO/2014/084685
Kind Code:
A1
Abstract:
The present application relates to a coating method for reducing the damage to a barrier layer. A barrier film of the present invention can improve a gas barrier property by inhibiting the deterioration of water permeability through a coating method without having direct contact with a barrier layer in the carrying out of protective coating for protecting the barrier layer of the barrier film.
Inventors:
KIM DONG RYUL (KR)
HWANG JANG YEON (KR)
LEE SEONG HWAN (KR)
RYU SANG UK (KR)
KIM JOON HYUNG (KR)
SON BEOM GWON (KR)
LEE HYUN JI (KR)
HWANG JANG YEON (KR)
LEE SEONG HWAN (KR)
RYU SANG UK (KR)
KIM JOON HYUNG (KR)
SON BEOM GWON (KR)
LEE HYUN JI (KR)
Application Number:
PCT/KR2013/011040
Publication Date:
June 05, 2014
Filing Date:
November 29, 2013
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C23C26/00
Domestic Patent References:
WO2003087247A1 | 2003-10-23 |
Foreign References:
KR20080036042A | 2008-04-24 | |||
KR20120061906A | 2012-06-13 | |||
KR20090077801A | 2009-07-15 | |||
US20120021236A1 | 2012-01-26 | |||
US20060165886A1 | 2006-07-27 | |||
US4198465A | 1980-04-15 | |||
US3708225A | 1973-01-02 | |||
US4177315A | 1979-12-04 | |||
US4309319A | 1982-01-05 | |||
US4436851A | 1984-03-13 | |||
US4455205A | 1984-06-19 | |||
US0142362A | 1873-09-02 | |||
EP1418197A1 | 2004-05-12 |
Other References:
See also references of EP 2927346A4
TUOMO SUNTOLA: "Atomic Layer Epitaxy", THIN SOLID FILMS, vol. 216, 1992, pages 84 - 89
M. LESKELA; M. RITALA: "ALD precursor chemistry: Evolution and future challenges", JOURNAL DE PHYSIQUE IV, vol. 9, 1999, pages 837 - 852, XP008006493
TUOMO SUNTOLA: "Atomic Layer Epitaxy", THIN SOLID FILMS, vol. 216, 1992, pages 84 - 89
M. LESKELA; M. RITALA: "ALD precursor chemistry: Evolution and future challenges", JOURNAL DE PHYSIQUE IV, vol. 9, 1999, pages 837 - 852, XP008006493
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
특허법인 다나 (KR)
특허법인 다나 (KR)
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