Title:
GAS BARRIER FILM HAVING PROTECTIVE COATING LAYER STACKED THEREON INCLUDING INORGANIC PARTICLES
Document Type and Number:
WIPO Patent Application WO/2014/084686
Kind Code:
A1
Abstract:
The present invention relates to a gas barrier film having a protective coating layer stacked thereon including inorganic particles. The gas barrier film of the present invention, in the process of implementing a protective coating to protect the gas barrier film, incorporates inorganic nanoparticles in a protective layer so that gas barrier effects can be maximized.
Inventors:
RYU SANG UK (KR)
KIM DONG RYUL (KR)
MOON JONG MIN (KR)
KIM DONG RYUL (KR)
MOON JONG MIN (KR)
Application Number:
PCT/KR2013/011041
Publication Date:
June 05, 2014
Filing Date:
November 29, 2013
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
B32B27/14; B05D5/00; C08J7/043; C08J7/048
Domestic Patent References:
| WO2003087247A1 | 2003-10-23 |
Foreign References:
| JP2012136614A | 2012-07-19 | |||
| JP2012182303A | 2012-09-20 | |||
| KR20070103204A | 2007-10-23 | |||
| KR20010076642A | 2001-08-16 | |||
| KR20090074998A | 2009-07-08 | |||
| US4198465A | 1980-04-15 | |||
| US3708225A | 1973-01-02 | |||
| US4177315A | 1979-12-04 | |||
| US4309319A | 1982-01-05 | |||
| US4436851A | 1984-03-13 | |||
| US4455205A | 1984-06-19 | |||
| US0142362A | 1873-09-02 | |||
| EP1418197A1 | 2004-05-12 |
Other References:
TUOMO SUNTOLA: "Atomic Layer Epitaxy", THIN SOLID FILMS, vol. 216, 1992, pages 84 - 89
M. LESKELA; M. RITALA: "ALD precursor chemistry: Evolution and future challenges", JOURNAL DE PHYSIQUE IV, vol. 9, 1999, pages 837 - 852, XP008006493
See also references of EP 2926991A4
M. LESKELA; M. RITALA: "ALD precursor chemistry: Evolution and future challenges", JOURNAL DE PHYSIQUE IV, vol. 9, 1999, pages 837 - 852, XP008006493
See also references of EP 2926991A4
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
특허법인 다나 (KR)
특허법인 다나 (KR)
Download PDF: