Title:
COLOR FILTER SUBSTRATE, DISPLAY PANEL, AND MASK
Document Type and Number:
WIPO Patent Application WO/2024/045984
Kind Code:
A1
Abstract:
A color filter substrate (10), a display panel (100), and a mask (200). The color filter substrate comprises a display area located in the middle and a non-display area located on the periphery of the display area, and comprises a substrate body (11), a color photoresist layer (12), and a supporting structure (13); the color photoresist layer (12) is arranged on one side of the substrate body (11) and comprises a plurality of photoresist units (121); the supporting structure (13) is located in the non-display area and comprises a plurality of primary supporting columns (131) and secondary supporting columns (132), and each primary supporting column (131) or secondary supporting column (132) is arranged on the side of one photoresist unit (121) facing away from the substrate body (11); each secondary supporting column (132) has a first top surface (S1) on the side facing away from the substrate body (11), and the first top surface (S1) has a planar area at least located in the middle; each primary supporting column (131) has a second top surface (S2) facing away from the substrate body (11), and the distance between the second top surface (S2) and the substrate body (11) is greater than the distance between the first top surface (S1) of the secondary supporting column (132) and the substrate body (11). The middle part of each secondary supporting column (132) of the color filter substrate (10) is a planar area, thereby improving the flatness of the first top surface (S1) and increasing the area of contact between the first top surface (S1) and another structure, such as a thin film transistor array substrate.
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Inventors:
YU YA (CN)
WANG YONGCAN (CN)
LI QUN (CN)
LU YANCHUN (CN)
DU RUIFANG (CN)
SHI SHENWEI (CN)
ZHANG RAN (CN)
WANG YONGCAN (CN)
LI QUN (CN)
LU YANCHUN (CN)
DU RUIFANG (CN)
SHI SHENWEI (CN)
ZHANG RAN (CN)
Application Number:
PCT/CN2023/110340
Publication Date:
March 07, 2024
Filing Date:
July 31, 2023
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G02F1/1339; G03F1/50
Foreign References:
| CN115308951A | 2022-11-08 | |||
| CN107463064A | 2017-12-12 | |||
| CN105988256A | 2016-10-05 | |||
| CN106681101A | 2017-05-17 | |||
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| CN102819180A | 2012-12-12 | |||
| CN105824189A | 2016-08-03 | |||
| CN109212890A | 2019-01-15 | |||
| CN209879249U | 2019-12-31 | |||
| CN211627998U | 2020-10-02 | |||
| JP2011145376A | 2011-07-28 | |||
| JPH04263254A | 1992-09-18 | |||
| KR20050098358A | 2005-10-12 | |||
| US5170293A | 1992-12-08 |
Attorney, Agent or Firm:
BEIJING BESTIPR INTELLECTUAL PROPERTY LAW CORPORATION (CN)
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