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Title:
COMPOSITE SUBSTRATE AND PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2012/074009
Kind Code:
A1
Abstract:
[Problem] To provide a composite substrate comprising a silicon substrate having few lattice defects. [Solution] A composite substrate (40) comprises an insulating substrate (30) and a functional layer (21) having one main surface joined to the upper surface of the substrate (30). The dopant concentration of this functional layer (21) decreases from the other main surface in the thickness direction toward the substrate (30) side.

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Inventors:
KITADA MASANOBU (JP)
OGAWA MOTOKAZU (JP)
Application Number:
PCT/JP2011/077677
Publication Date:
June 07, 2012
Filing Date:
November 30, 2011
Export Citation:
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Assignee:
KYOCERA CORP (JP)
KITADA MASANOBU (JP)
OGAWA MOTOKAZU (JP)
International Classes:
H01L21/02; H01L21/20; H01L21/205; H01L27/12
Foreign References:
JPH08191138A1996-07-23
JP2008530801A2008-08-07
JP2004134672A2004-04-30
JP2010087492A2010-04-15
JP2009152565A2009-07-09
Other References:
See also references of EP 2648210A4
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