COMPOSITION FOR ACTINIC ENERGY RAY AND METHOD OF FORMING PATTERN

Title:

COMPOSITION FOR ACTINIC ENERGY RAY AND METHOD OF FORMING PATTERN

Document Type and Number:

WIPO Patent Application WO/2003/025674

Kind Code:

A1

Abstract:

A composition for actinic energy rays which comprises (A) a specific compound having a vinyl ether group bonded to a secondary or tertiary carbon, (B) a polymer having carboxy or&sol and hydroxyphenyl groups, and (C) a photo−acid generator. The composition can form a resist pattern with excellent resolution without being heated at a temperature not lower than 60°C after exposure.

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Inventors:

IWASHIMA CHIAKI (JP)
IMAI GENJI (JP)
HASEGAWA TAKEYA (JP)

Application Number:

PCT/JP2002/009185

Publication Date:

March 27, 2003

Filing Date:

September 10, 2002

Export Citation:

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Assignee:

KANSAI PAINT CO LTD (JP)
IWASHIMA CHIAKI (JP)
IMAI GENJI (JP)
HASEGAWA TAKEYA (JP)

International Classes:

C08F290/06; C08F291/00; G03F7/027; G03F7/032; G03F7/033; G03F7/038; (IPC1-7): G03F7/039; G03F7/004; H01L21/027; C08L101/06; C08F291/00

Foreign References:

JP2000267285A	2000-09-29
US5496678A	1996-03-05
JPH06308733A	1994-11-04
JPH06230574A	1994-08-19
US5876900A	1999-03-02

Attorney, Agent or Firm:

Kaneda, Nobuyuki (16th Kowa Bldg. 9-20, Akasaka 1-chom, Minato-ku Tokyo, JP)

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