Title:
COMPOSITION AND APPLICATION THEREOF IN PREPARATION OF SKIN CARE PRODUCTS FOR REGULATING SKIN BIORHYTHM
Document Type and Number:
WIPO Patent Application WO/2021/057380
Kind Code:
A1
Abstract:
A skin care composition for regulating skin biorhythm, comprising: a skin conditioning agent A, a skin conditioning agent B, and adenosine. The skin conditioning agent A comprises glycoprotein, amino acid, a preservative, a stabilizing agent, and water, and the skin conditioning agent B comprises glutamine-based ethyl imidazole, a preservative, and water. The skin care composition can replenish moisture and promote cellular energy synthesis, and can solve the skin problem of people who stay up late.
More Like This:
Inventors:
DAI YUEFENG (CN)
YAN SHAOWEI (CN)
HE GUANGWEN (CN)
QIAN JINGRU (CN)
XU XIAOQUN (CN)
YAN SHAOWEI (CN)
HE GUANGWEN (CN)
QIAN JINGRU (CN)
XU XIAOQUN (CN)
Application Number:
PCT/CN2020/112021
Publication Date:
April 01, 2021
Filing Date:
August 28, 2020
Export Citation:
Assignee:
HUNAN YUJIA COSMETICS MFG CO LTD (CN)
International Classes:
A61K8/64; A61K8/34; A61K8/44; A61K8/49; A61K8/60; A61K8/9728; A61Q19/00
Domestic Patent References:
WO2019008452A1 | 2019-01-10 | |||
WO2015114176A1 | 2015-08-06 |
Foreign References:
CN110448478A | 2019-11-15 | |||
CN107898689A | 2018-04-13 | |||
CN107929094A | 2018-04-20 |
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW (CN)
Download PDF:
Previous Patent: EFFICIENT STERILIZATION METHOD USING VACUUM CIRCULATING OZONE
Next Patent: RUNWAY ALGAE CULTURING SYSTEM
Next Patent: RUNWAY ALGAE CULTURING SYSTEM