Title:
COMPOSITION FOR FORMING BOTTOM COATING FOR LITHOGRAPHY CONTAINING METAL OXIDE
Document Type and Number:
WIPO Patent Application WO/2006/040956
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a bottom coating having a high content of an inorganic substance (hard mask) which is used in a lithography process for manufacturing a semiconductor device, is free from the intermixing with a photoresist and can be formed by the spin coating method, and a bottom coating forming composition for forming said bottom coating. [MEANS FOR SOLVING PROBLEMS] A composition for forming a bottom coating for lithography which comprises a metal oxide obtainable through the hydrolysis reaction of an oxymetal compound such as zirconium alkoxide, and a solvent.
Inventors:
TAKEI SATOSHI (JP)
SAKAIDA YASUSHI (JP)
HASHIMOTO KEISUKE (JP)
SAKAIDA YASUSHI (JP)
HASHIMOTO KEISUKE (JP)
Application Number:
PCT/JP2005/018294
Publication Date:
April 20, 2006
Filing Date:
October 03, 2005
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
TAKEI SATOSHI (JP)
SAKAIDA YASUSHI (JP)
HASHIMOTO KEISUKE (JP)
TAKEI SATOSHI (JP)
SAKAIDA YASUSHI (JP)
HASHIMOTO KEISUKE (JP)
International Classes:
G03F7/11; C08G79/00; G03F7/26; H01L21/027
Foreign References:
| JP2000275820A | 2000-10-06 | |||
| JP2002343767A | 2002-11-29 | |||
| JPS589140A | 1983-01-19 | |||
| JP2001166490A | 2001-06-22 | |||
| JP2000010293A | 2000-01-14 | |||
| JPH01137635A | 1989-05-30 | |||
| JP2001053068A | 2001-02-23 | |||
| JP2003063166A | 2003-03-05 |
Attorney, Agent or Firm:
Hanabusa, Tsuneo c/o Hanabusa, Patent Office (Shin-Ochanomizu Urban Trinity 2,
Kandasurugadai 3-chome, Chiyoda-k, Tokyo 62, JP)
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