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Title:
COMPOSITION FOR FORMING GAS BARRIER FILM, GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2022/138863
Kind Code:
A1
Abstract:
[Problem] To provide a composition for forming a gas barrier film, said composition having high film formation properties; and a gas barrier film which has a low HAZE (haze value), high transparency and high water vapor barrier properties. [Solution] A composition for forming a gas barrier film, said composition containing the component (A), the component (B) and the component (C) described below. Component (A): plate-like particles (A), each of which is formed of a release layer substance generated by delamination of a layered compound, and which have an average thickness of from 0.7 nm to 100 nm, an average length of from 100 nm to 100,000 nm, and a (maximum length)/(width perpendicular to maximum length) value of from 1.0 to 10.0, while containing a quaternary ammonium ion (a) that has a total number of carbon atoms of from 13 to 45, while having one or two alkyl groups each having from 10 to 20 carbon atoms, and an anionic surfactant (b) that has ammonium ions, wherein both the constituents (a) and (b) have a mass that is within the range of from 0% by mass (exclusive) to 3.0% by mass (inclusive) relative to the mass of the plate-like particles (A) Component (B): a water-soluble polymer (B) Component (C): an aqueous medium A composition for forming a gas barrier film, wherein the layered compound is an ilerite. A molded body which comprises a base material and a gas barrier film that is arranged on the surface of the base material.

Inventors:
HIDA MASAHIRO (JP)
YAMADA SHUHEI (JP)
LIU JIAHAO (JP)
KITAGAWA HIROTAKE (JP)
Application Number:
PCT/JP2021/048012
Publication Date:
June 30, 2022
Filing Date:
December 23, 2021
Export Citation:
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Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
B32B9/00; C08K3/24; C08K3/28; C08K3/34; C08K5/17; C08L23/08; C08L29/04; C08L33/02; C08L101/00; C08L101/08
Domestic Patent References:
WO2020153352A12020-07-30
WO2020153352A12020-07-30
Foreign References:
JPH0867578A1996-03-12
JPH092813A1997-01-07
JP2020011861A2020-01-23
JP2021059468A2021-04-15
JP2001316551A2001-11-16
JP2007313891A2007-12-06
JP2011057912A2011-03-24
JP2020513298A2020-05-14
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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