Title:
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
Document Type and Number:
WIPO Patent Application WO/2021/172295
Kind Code:
A1
Abstract:
Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film includes a polymer (X) and a solvent, the polymer (X) containing: a plurality of structural units which are the same as or different from each other and have a methoxymethyl group and a ROCH2- group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) other than the methoxymethyl group; and a linking group that links the plurality of structural units.
Inventors:
TOKUNAGA HIKARU (JP)
KURAMOTO YUTARO (JP)
NAKAJIMA MAKOTO (JP)
HAMADA SATOSHI (JP)
MIURA KATSUYA (JP)
KURAMOTO YUTARO (JP)
NAKAJIMA MAKOTO (JP)
HAMADA SATOSHI (JP)
MIURA KATSUYA (JP)
Application Number:
PCT/JP2021/006710
Publication Date:
September 02, 2021
Filing Date:
February 22, 2021
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; G03F7/26; H01L21/027
Foreign References:
| JP2015134926A | 2015-07-27 | |||
| JP2019124943A | 2019-07-25 | |||
| JP2021015205A | 2021-02-12 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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