COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKELETON

Title:

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKELETON

Document Type and Number:

WIPO Patent Application WO/2023/120616

Kind Code:

A1

Abstract:

The present invention provides a composition for forming a resist underlayer film, the composition comprising a solvent and a polymer containing the structure represented by formula (A). (In formula (A), "*" represents a bond.)

Inventors:

HIROHARA TOMOTADA (JP)
TAMURA MAMORU (JP)

Application Number:

PCT/JP2022/047257

Publication Date:

June 29, 2023

Filing Date:

December 22, 2022

Export Citation:

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Assignee:

NISSAN CHEMICAL CORP (JP)

International Classes:

C08G59/14; G03F7/11; G03F7/20

Domestic Patent References:

WO2011033965A1	2011-03-24
WO2020006734A1	2020-01-09

Foreign References:

JP2014115636A	2014-06-26
JP2011215433A	2011-10-27
JP2013045055A	2013-03-04

Attorney, Agent or Firm:

TAKAOKA Ryoichi et al. (JP)

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