Title:
COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER
Document Type and Number:
WIPO Patent Application WO/2021/039274
Kind Code:
A1
Abstract:
Provided is a composition which has an excellent affinity with the surface of an adhesive agent and can achieve a high etching rate. The composition according to one embodiment comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and, as an aprotic solvent, (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) a dipropylene glycol dimethyl ether, wherein (B) the dipropylene glycol dimethyl ether has the percentage of a structural isomer represented by formula (1) of at least 50 mass% with respect to the total amount of (B) the dipropylene glycol dimethyl ether.
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Inventors:
HAYASHI KOTARO (JP)
Application Number:
PCT/JP2020/029340
Publication Date:
March 04, 2021
Filing Date:
July 30, 2020
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
C09D9/00; C11D7/26; C11D7/32; C11D7/50; H01L21/304
Domestic Patent References:
| WO2014092022A1 | 2014-06-19 |
Foreign References:
| JP2004000969A | 2004-01-08 | |||
| JP2008252100A | 2008-10-16 | |||
| JP2017199754A | 2017-11-02 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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