Title:
COMPOUND HAVING SELF-ASSEMBLING ABILITY, MATERIAL FOR FORMING SELF-ASSEMBLED PATTERN, AND PROCESS FOR PRODUCING SELF-ASSEMBLED THIN FILM
Document Type and Number:
WIPO Patent Application WO/2016/060077
Kind Code:
A1
Abstract:
A purpose of the present invention is to provide a compound which has an excellent self-assembling ability and can undergo micro-phase separation under milder conditions in a shorter time as compared with conventional annealing treatments.
This compound, which has a self-assembling ability, is characterized by being represented by general formula (1) (in general formula (1), G is a linear sugar chain). Also provided are: a material for forming a self-assembled pattern, characterized by comprising the compound having a self-assembling ability; and a process for producing a self-assembled thin film, characterized by including a step in which the material for forming a self-assembled pattern is used to form a self-assembled thin film on a substrate.
Inventors:
TAKEDA TAKASHI (JP)
INAJI SHINSUKE (JP)
INAJI SHINSUKE (JP)
Application Number:
PCT/JP2015/078729
Publication Date:
April 21, 2016
Filing Date:
October 09, 2015
Export Citation:
Assignee:
NAGASE CHEMTEX CORP (JP)
International Classes:
C08G77/38; C08G77/42; C08G81/00
Foreign References:
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JPH08269204A | 1996-10-15 | |||
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JP2015107941A | 2015-06-11 |
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
Patent business corporation Yasutomi international patent firm (JP)
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