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Title:
COMPOUND HAVING SELF-ASSEMBLING ABILITY, MATERIAL FOR FORMING SELF-ASSEMBLED PATTERN, AND PROCESS FOR PRODUCING SELF-ASSEMBLED THIN FILM
Document Type and Number:
WIPO Patent Application WO/2016/060077
Kind Code:
A1
Abstract:
A purpose of the present invention is to provide a compound which has an excellent self-assembling ability and can undergo micro-phase separation under milder conditions in a shorter time as compared with conventional annealing treatments. This compound, which has a self-assembling ability, is characterized by being represented by general formula (1) (in general formula (1), G is a linear sugar chain). Also provided are: a material for forming a self-assembled pattern, characterized by comprising the compound having a self-assembling ability; and a process for producing a self-assembled thin film, characterized by including a step in which the material for forming a self-assembled pattern is used to form a self-assembled thin film on a substrate.

Inventors:
TAKEDA TAKASHI (JP)
INAJI SHINSUKE (JP)
Application Number:
PCT/JP2015/078729
Publication Date:
April 21, 2016
Filing Date:
October 09, 2015
Export Citation:
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Assignee:
NAGASE CHEMTEX CORP (JP)
International Classes:
C08G77/38; C08G77/42; C08G81/00
Foreign References:
JP2009537484A2009-10-29
JP2003147082A2003-05-21
JPH1192490A1999-04-06
JPH05186596A1993-07-27
JP2000186150A2000-07-04
JPH06316590A1994-11-15
US20070276113A12007-11-29
JP2014047269A2014-03-17
JPH10330489A1998-12-15
JPH0770204A1995-03-14
JP2008545838A2008-12-18
JPH08269204A1996-10-15
JPS6268820A1987-03-28
JP2015107941A2015-06-11
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
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