Title:
CONTINUOUS DIRECT-WRITE OPTICAL LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2004019079
Kind Code:
A3
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.
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Inventors:
MEISBURGER WILLIAM DANIEL (US)
Application Number:
PCT/US2003/026416
Publication Date:
June 16, 2005
Filing Date:
August 20, 2003
Export Citation:
Assignee:
MEISBURGER WILLIAM DANIEL (US)
International Classes:
G02B27/18; G03F7/20; H01L21/027; (IPC1-7): G02B26/00; G02B26/08; G02F1/29
Foreign References:
| US6312134B1 | 2001-11-06 |
Other References:
See also references of EP 1573366A4
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