METHOD FOR FABRICATING OPTICAL DEVICES IN PHOTONIC CRYSTAL STRUCTURES

WIPO Patent Application WO2004019080

A3

A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist (9) is coated on a substrate (10) and exposed to an e-beam (11), to produce an imaged area (12). Another resist coating is applied to thicken the resist (13) and an interference exposure (15) is used to image the result. This is developed to form periodic voids (16), which may be filled with a materials having a high refractive index to form a pattern (18 and 12) when the resist (13) is removed.

JPH04213406	OPTICAL WAVEGUIDE AND ITS PRODUCTION
JP5229617	Optical Waveguide Devices and Their Manufacturing Methods
JP3389226	OPTICAL SUB-MODULE AND HYBRID OPTICAL INTEGRATED CIRCUIT

MURAKOWSKI JANUSZ (US)
PRATHER DENNIS W (US)

PCT/US2003/026499

June 17, 2004

August 26, 2003

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UNIV DELAWARE (US)
MURAKOWSKI JANUSZ (US)
PRATHER DENNIS W (US)

G02B6/122; (IPC1-7): G03H1/02

EP0964305A1	1999-12-15
JPH0340481A	1991-02-21
JPH06283813A	1994-10-07
USRE35930E
US4403151A	1983-09-06
US4517280A	1985-05-14
JPS599920A	1984-01-19
EP0997994A1	2000-05-03

CAMPBELL M. ET AL.: "Fabrication of photonic crystals for the visible spectrum by holographic lithography", NATURE, vol. 404, 2 March 2000 (2000-03-02), pages 53 - 56, XP000953885
TURBERFIELD A.J.: "Photonic crystals made by holographic lithography", MRS BULLETIN, August 2001 (2001-08-01), pages 632 - 636, XP002974207
LIN B.J.: "Combined optical and electron-beam means to produce 50- nanometer integrated circuit patterns", IBM TECH. DISCL., vol. 19, no. 7, December 1976 (1976-12-01), pages 2779 - 2782, XP002974208

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