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Title:
CURABLE COMPOSITION FOR IMPRINT, PATTERN FORMING METHOD, AND PATTERN
Document Type and Number:
WIPO Patent Application WO/2013/047136
Kind Code:
A1
Abstract:
Provided is a curable composition for imprint, a cured film of which has improved surface roughness. A curable composition for imprint, which contains (A) a polymerizable compound, (B) a polymerization initiator and (C) a non-polymerizable compound. The curable composition for imprint contains, as the non-polymerizable compound (C): (C1) at least one kind of surfactant that contains 20% by mass of more of fluorine atoms; and (C2) at least one kind of polymer that contains 3% by mass or more but less than 20% by mass of fluorine atoms and/or 5% by mass or more but less than 40% by mass of silicon atoms and that has a weight average molecular weight (Mw) of 1,000-100,000.

Inventors:
ENOMOTO YUICHIRO (JP)
KODAMA KUNIHIKO (JP)
TARUTANI SHINJI (JP)
Application Number:
PCT/JP2012/072686
Publication Date:
April 04, 2013
Filing Date:
September 06, 2012
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
ENOMOTO YUICHIRO (JP)
KODAMA KUNIHIKO (JP)
TARUTANI SHINJI (JP)
International Classes:
H01L21/027; B29C59/02; C08F2/44
Domestic Patent References:
WO2008155928A12008-12-24
Foreign References:
JP2010206189A2010-09-16
JP2007001250A2007-01-11
JP2006054300A2006-02-23
JP2008168480A2008-07-24
JP2011159881A2011-08-18
JP2011183554A2011-09-22
JP2012049152A2012-03-08
JP2012216655A2012-11-08
JP2012216682A2012-11-08
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
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Claims:



 
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