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Title:
CYCLOOLEFIN-BASED RESIN COMPOSITION FILM
Document Type and Number:
WIPO Patent Application WO/2015/080167
Kind Code:
A1
Abstract:
A cycloolefin-based resin composition film which exhibits excellent preservation stability against environmental changes and excellent toughness is provided. This composition film comprises both a cycloolefin-based resin (11) and a styrene-based elastomer (12) which exhibits a melt flow rate of 4.5g/10min or less as determined according to ISO 1133 at 230ºC under a load of 2.16kgf. The styrene-based elastomer (12) is dispersed in the cycloolefin-based resin (11) with the content of the elastomer (12) being 5 to 35wt%, and the minor axis diameters of the dispersed particles of the styrene-based elastomer (12) are 2μm or less. Thus, excellent preservation stability against environmental changes and excellent toughness can be attained.

Inventors:
OBATA KEI (JP)
HORII AKIHIRO (JP)
ISHIMORI TAKU (JP)
HOSOYA KEN (JP)
HASHIMOTO KANAKO (JP)
HIRATA KAZUKI (JP)
Application Number:
PCT/JP2014/081279
Publication Date:
June 04, 2015
Filing Date:
November 26, 2014
Export Citation:
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Assignee:
DEXERIALS CORP (JP)
International Classes:
C08J5/18; B29C48/305; C08L45/00; C08L53/02; G02B5/30; B29C48/08; B29K23/00; B29L7/00
Domestic Patent References:
WO2014034200A12014-03-06
WO2013179781A12013-12-05
Foreign References:
JPH07258504A1995-10-09
JPH1121413A1999-01-26
JP2004156048A2004-06-03
JP2000511582A2000-09-05
JPH07238190A1995-09-12
JPH09268250A1997-10-14
Attorney, Agent or Firm:
NOGUCHI, NOBUHIRO (JP)
Nobuhiro Noguchi (JP)
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