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Patent Searching and Data


Title:
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2011/093022
Kind Code:
A1
Abstract:
Disclosed is a defect inspection device having: a illumination optical system that radiates illumination light to a predetermined region of an inspected object; a detection optical system provided with a detector that can, with a plurality of pixels, detect scattered light from the predetermined region of said inspected object arising from the illumination light from the aforementioned illumination optical system; and a signal processing unit that is provided with a correction unit, which corrects pixel offset—caused by variations in the direction normal to the surface of said inspected object—in a detection signal that is on the basis of the scattered light detected by the detector of the aforementioned detection optical system, and a defect determination unit, which determines defects of the surface of said inspected object on the basis of the detection signal corrected by the aforementioned correction unit.

Inventors:
NAKAO TOSHIYUKI (JP)
MARUYAMA SHIGENOBU (JP)
URANO YUTA (JP)
HONDA TOSHIFUMI (JP)
Application Number:
PCT/JP2011/000187
Publication Date:
August 04, 2011
Filing Date:
January 17, 2011
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
NAKAO TOSHIYUKI (JP)
MARUYAMA SHIGENOBU (JP)
URANO YUTA (JP)
HONDA TOSHIFUMI (JP)
International Classes:
G01N21/956; H01L21/66
Foreign References:
JP2008268140A2008-11-06
JP2005517906A2005-06-16
JP2009276273A2009-11-26
Attorney, Agent or Firm:
INOUE, Manabu et al. (JP)
Manabu Inoue (JP)
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Claims: