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Title:
DEFECT REPAIR DEVICE AND DEFECT REPAIR METHOD
Document Type and Number:
WIPO Patent Application WO2006006635
Kind Code:
A3
Abstract:
A defect repair device (40) includes a defect inspection unit (45) configured to find a size of a protruding defect on a front surface (23) of a multi-layer film (20) having a rear surface opposite to the front surface, a calculation unit (46) configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit (45), an energy supplier (41), and an energy controller (46) configured to control the energy supplier (41) to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film (20) from the rear surface of the multi-layer film (20) so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film (20).

Inventors:
IKUTA YOSHIAKI (US)
UNO TOSHIYUKI (US)
Application Number:
PCT/JP2005/012964
Publication Date:
May 26, 2006
Filing Date:
July 07, 2005
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
IKUTA YOSHIAKI (US)
UNO TOSHIYUKI (US)
International Classes:
G03F7/20; G21K1/06
Domestic Patent References:
WO2002027404A22002-04-04
Foreign References:
US20030164949A12003-09-04
Other References:
HAU-RIEGE S P, STEARNS D G: "Correction of figure errors on optical surfaces by laser-induced contraction of Mo/Si multilayers", OPTICS LETTERS, vol. 28, no. 6, 15 March 2003 (2003-03-15), pages 456 - 458, XP002367868
STEARNS D G ET AL: "Thermally induced structural modification of Mo-Si multilayers", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 67, no. 5, 1 March 1990 (1990-03-01), pages 2415 - 2427, XP002212713, ISSN: 0021-8979
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