Title:
DEPOSITION DEVICE AND DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/063401
Kind Code:
A1
Abstract:
The present invention relates to a deposition device and a deposition method using a linear deposition source, wherein the deposition device may comprise: a substrate supporter by which a substrate is supported; a linear deposition source which includes a linear source gas nozzle part and a linear reactive gas nozzle part parallelly arranged in a first axial direction crossing the substrate and sprays each of a source gas and a reactive gas onto the substrate; a driving part for moving the substrate supporter in a second axial direction crossing the first axial direction; a position detection part for detecting the position of the substrate supporter in the second axial direction; and an injection control part for individually controlling gas injection of the linear source gas nozzle part and the linear reactive gas nozzle part according to the detected position of the substrate supporter in the second axial direction.
Inventors:
CHOO MIN KOOK (KR)
JEONG HONG KI (KR)
SONG GIL HO (KR)
JEONG HONG KI (KR)
SONG GIL HO (KR)
Application Number:
PCT/KR2023/013347
Publication Date:
March 28, 2024
Filing Date:
September 06, 2023
Export Citation:
Assignee:
AP SYSTEMS INC (KR)
International Classes:
C23C16/455; C23C16/458; C23C16/50; C23C16/52
Foreign References:
| KR101868462B1 | 2018-06-21 | |||
| KR101939278B1 | 2019-01-18 | |||
| KR20180000904A | 2018-01-04 | |||
| US20190186012A1 | 2019-06-20 | |||
| US20140127404A1 | 2014-05-08 |
Attorney, Agent or Firm:
AHN, Joon-Hyung (KR)
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