Title:
DESIGN LAYOUT-BASED METROLOGY METHOD AND APPARATUS FOR SCANNING ELECTRON MICROSCOPE IMAGE
Document Type and Number:
WIPO Patent Application WO/2024/045295
Kind Code:
A1
Abstract:
A design layout-based metrology method, apparatus, and device for a scanning electron microscope image, and a computer readable storage medium. The method comprises: determining a target metrology point according to coordinate position information of a design layout (S201); generating all metrology boxes within a preset metrology range on the basis of the design layout and a preset metrology condition (S202); generating a metrology recipe file according to the target metrology point and all the metrology boxes, and acquiring a scanning electron microscope image of the target metrology point on the basis of the metrology recipe file (S203); aligning the scanning electron microscope image with the design layout to obtain an alignment result (S204); and performing a metrology process on the scanning electron microscope image on the basis of the alignment result and the metrology recipe file to obtain a metrology value, and outputting the metrology value (S205). Human labor and time can be saved, the application range of the metrology method can be expanded, and manual introduction of errors can be avoided.
Inventors:
YAN CHANGLIAN (CN)
Application Number:
PCT/CN2022/126949
Publication Date:
March 07, 2024
Filing Date:
October 24, 2022
Export Citation:
Assignee:
DONGFANG JINGYUAN ELECTRON LTD (CN)
International Classes:
G06T7/00; G06T7/70; G06V30/422
Foreign References:
| US20090242760A1 | 2009-10-01 | |||
| JP2011043458A | 2011-03-03 | |||
| US20070156275A1 | 2007-07-05 | |||
| CN110491797A | 2019-11-22 | |||
| CN105573047A | 2016-05-11 | |||
| CN112364508A | 2021-02-12 |
Attorney, Agent or Firm:
IP MARCH (CN)
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