Title:
DEVICE FOR AUTOMATICALLY REMOVING SURFACE RESIDUAL LIQUID
Document Type and Number:
WIPO Patent Application WO/2019/071950
Kind Code:
A1
Abstract:
A device for automatically removing surface residual liquid, comprising a base (1), a cleaning box (7), a casing (8), a liquid mixing box (14) and a condensation box (24); the base (1) is mounted at a top portion of the casing (8), and the cleaning box (7) is mounted at a side at the interior of the casing (8), the condensation box (24) being mounted at the other side at the interior of the casing (8); a water box (26) is mounted at a bottom end at the interior of the condensation box (24), and a water pump (27) is mounted at a bottom portion of a side of the water box (26) that is far from the cleaning box (7), while a water outlet pipe (18) is mounted at an output end of the water pump (27), the water outlet pipe (18) passing through the water box (26) and the cleaning box (7) and extending into the interior of the cleaning box (7). A support plate (9) is hinged to the liquid mixing box(14), and a cleaning agent and water may be uniformly mixed by means of shaking the liquid mixing box (14), a spiral pipe (16) being mounted within the liquid mixing box (14).
More Like This:
| JP5775383 | Substrate cleaning method |
| WO/2001/031691 | METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR WAFER |
Inventors:
YAN BIZHU (CN)
Application Number:
PCT/CN2018/086632
Publication Date:
April 18, 2019
Filing Date:
May 13, 2018
Export Citation:
Assignee:
YAN BIZHU (CN)
International Classes:
B08B1/04; B08B3/02; F26B21/00
Foreign References:
| CN207371919U | 2018-05-18 | |||
| CN107470211A | 2017-12-15 | |||
| CN207254801U | 2018-04-20 | |||
| CN205550991U | 2016-09-07 | |||
| CN203917200U | 2014-11-05 | |||
| CN106903092A | 2017-06-30 | |||
| CN106076974A | 2016-11-09 | |||
| JPH0193197A | 1989-04-12 |
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