Title:
DEVICE AND METHOD FOR FORMING CARBON-CONTAINING FILM ON SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2023/074377
Kind Code:
A1
Abstract:
Provided is a technology for using high-frequency power in the VHF or UHF band to form a good-quality carbon-containing film. According to the present invention, a device that forms a carbon-containing film on a substrate comprises a mounting stand on which the substrate is mounted and a gas shower head for supplying a film formation gas for the carbon-containing film, the mounting stand constituting a lower electrode, and the gas shower head constituting an upper electrode and being connected to a high-frequency power supply that supplies high-frequency power in the VHF or UHF band. The distance between the mounting stand and the gas shower head is set to be 1–4 times the skin depth of the film formation gas plasma formed by supply of the film formation gas into a processing container from the gas shower head and supply of the high-frequency power to the upper electrode from the high-frequency power supply.
Inventors:
KATO TAKAAKI (JP)
KANEKO MIYAKO (JP)
SUZUKI NAOKO (JP)
KANEKO MIYAKO (JP)
SUZUKI NAOKO (JP)
Application Number:
PCT/JP2022/038081
Publication Date:
May 04, 2023
Filing Date:
October 12, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
C23C16/26; C23C16/509
Domestic Patent References:
| WO2020086241A1 | 2020-04-30 |
Foreign References:
| JPH06256957A | 1994-09-13 |
Attorney, Agent or Firm:
YAYOY PATENT OFFICE (JP)
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