DIAGNOSTIC DEVICE, DIAGNOSTIC METHOD, SEMICONDUCTOR MANUFACTURING DEVICE SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM

WIPO Patent Application WO/2023/162077

A1

The present invention makes it possible to detect fault in the state of a device when it is not possible to accurately extract the rise or fall of monitoring signals corresponding to the start and end of individiual subsequences. In the present invention, a device-diagnosing device is configured to set a masking time period for a first time series signal obtained from a sensor, create data in which the first time series signal corresponding to the masking time period is masked, create a standardization model using the data in which the first time series signal is masked, perform a process of standardizing data in which the first time series signal is masked using the standardization model, create a normal model using a plurality of data, mask a second time series signal in the masking time period for a second time series signal obtained from the sensor, perform a standardizing process using the standardization model, and calculate a fault value from the signal resulting after the second time series signal was subjected to the standardization process.

YAMAMOTO MASAAKI (JP)
ASAKURA RYOJI (JP)
SUMIYA MASAHIRO (JP)
KAWAGUCHI YOHEI (JP)

PCT/JP2022/007541

August 31, 2023

February 24, 2022

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HITACHI HIGH TECH CORP (JP)

H01L21/02; G05B23/02

JP2011243118A	2011-12-01
JP2004186445A	2004-07-02
JP2018055552A	2018-04-05
JP2012058890A	2012-03-22
JP2020204832A	2020-12-24

POLAIRE I.P.C. (JP)

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