Title:
ELECTRON BEAM GENERATION SOURCE, ELECTRON BEAM EMISSION DEVICE, AND X-RAY EMISSION DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/210237
Kind Code:
A1
Abstract:
This electron beam generation source comprises: an electron discharge unit that extends along a desired axis and emits electrons; a movable unit that is linked to one end of the electron discharge unit; a support unit that supports the movable unit so that the same is movable along the axis line; and a tension maintenance unit that maintains tension in the electron discharge unit by applying a pressing force or a tensile force to the movable unit. The movable unit and the tension maintenance unit are respectively disposed on the axis.
Inventors:
HARAGUCHI DAI (JP)
HASEGAWA YOSHITO (JP)
HASEGAWA YOSHITO (JP)
Application Number:
PCT/JP2021/003083
Publication Date:
October 21, 2021
Filing Date:
January 28, 2021
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
H01J35/00; G21K5/00; G21K5/02; G21K5/04; H01J1/18; H01J1/22; H01J19/12; H01J19/16; H01J35/06; H05G1/00
Foreign References:
| JPS61264648A | 1986-11-22 | |||
| JP2002157966A | 2002-05-31 | |||
| JP2004077269A | 2004-03-11 | |||
| JP2000066000A | 2000-03-03 | |||
| JPH08264138A | 1996-10-11 |
Other References:
See also references of EP 4131323A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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