Title:
ELECTRON BEAM SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/117125
Kind Code:
A1
Abstract:
Disclosed in the embodiments of the present invention is an electron microscope, comprising: an electron source, which is configured to generate an electron beam; a first beam conduit, which is configured to accelerate the electron beam; a second beam conduit, which is configured to accelerate the electron beam; a first control electrode, which is disposed between the first beam conduit and the second beam conduit and configured to change the direction of movement of backscattered electrons and secondary electrons generated by the electron beam acting on a sample to be tested; and a first detector, which is disposed between the first beam conduit and the first control electrode and configured to receive the backscattered electrons generated by the electron beam acting on the sample to be tested. In the embodiments of the present invention, a first control electrode changes the direction of movement of backscattered electrons and secondary electrons generated by an electron beam generated by an electron source acting on a sample to be tested, so that a first detector disposed between the first beam conduit and the first control electrode can receive pure backscattered electrons generated by the electron beam acting on the sample to be tested.
Inventors:
LI SHUAI (CN)
Application Number:
PCT/CN2022/074101
Publication Date:
June 09, 2022
Filing Date:
January 26, 2022
Export Citation:
Assignee:
FOCUS EBEAM TECH BEIJING CO LTD (CN)
International Classes:
H01J37/26
Foreign References:
| US20060226360A1 | 2006-10-12 | |||
| CN103733299A | 2014-04-16 | |||
| CN110869752A | 2020-03-06 |
Attorney, Agent or Firm:
CHINA PAT INTELLECTUAL PROPERTY OFFICE (CN)
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