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Title:
EVAPORATION RATE CONTROL DEVICE, METHOD AND APPARATUS FOR EVAPORATION SOURCE, AND STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/206138
Kind Code:
A1
Abstract:
An evaporation rate control device for an evaporation source, the device comprising a controller (1) and an online acquisition instrument (2) connected to one another, wherein the online acquisition instrument (2) is used for acquiring a coating parameter of a substrate and sending the coating parameter to the controller (1); and the controller (1) is used for generating a heating power adjustment amount according to the received coating parameter and controlling the evaporation rate of an evaporation source on the basis of the amount of heating power adjustment. Further disclosed are an evaporation rate control method and apparatus for an evaporation source, and a computer-readable storage medium.

Inventors:
WANG XIAOWEI (CN)
Application Number:
PCT/CN2019/083886
Publication Date:
October 31, 2019
Filing Date:
April 23, 2019
Export Citation:
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Assignee:
BEIJING APOLLO DING RONG SOLAR TECH CO LTD (CN)
International Classes:
C23C14/54; C23C14/24
Domestic Patent References:
WO2002075017A12002-09-26
Foreign References:
CN108342712A2018-07-31
CN208501091U2019-02-15
CN101599515A2009-12-09
CN101599515A2009-12-09
CN103540906A2014-01-29
CN105887020A2016-08-24
CN103469172A2013-12-25
Attorney, Agent or Firm:
AFD CHINA INTELLECTUAL PROPERTY LAW OFFICE (CN)
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