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Title:
EXHAUST GAS TREATMENT DEVICE FOR SHIPS
Document Type and Number:
WIPO Patent Application WO/2021/029149
Kind Code:
A1
Abstract:
Provided is an exhaust gas treatment device for ships that comprises a reactor column which receives exhaust gas introduced thereto and is supplied with a liquid for treating the exhaust gas. The reactor column has an exhaust gas introduction pipe for introducing exhaust gas from the outside of the reactor column to the inside and one or more wastewater pipes for discharging the liquid supplied to the inside of the reactor column to the outside of the reactor column. At least one of the one or more wastewater pipes is provided below the exhaust gas introduction pipe. The reactor column may also have a sensor that detects liquid and that is installed at a predetermined height from the bottom of the reactor column, the exhaust gas introduction pipe may be installed on a side wall of the reactor column, and the sensor may be installed below the exhaust gas introduction pipe.

Inventors:
MOCHIDA TOSHIHARU (JP)
KANEKO TAKAYUKI (JP)
HAYASHI KAZUKI (JP)
UCHIDA YUKIKO (JP)
SUGIMOTO TATSUNORI (JP)
Application Number:
PCT/JP2020/025431
Publication Date:
February 18, 2021
Filing Date:
June 29, 2020
Export Citation:
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Assignee:
FUJI ELECTRIC CO LTD (JP)
International Classes:
B01D53/50; B01D53/14; B01D53/78; B01D53/92
Domestic Patent References:
WO2016208273A12016-12-29
Foreign References:
JP2005066505A2005-03-17
JP2015116529A2015-06-25
CN102151482A2011-08-17
JP2004197624A2004-07-15
JP2015080755A2015-04-27
JP2017136554A2017-08-10
JP2004089770A2004-03-25
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
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