EXPOSURE APPARATUS AND EXPOSURE METHOD

Title:

EXPOSURE APPARATUS AND EXPOSURE METHOD

Document Type and Number:

WIPO Patent Application WO/2004/049410

Kind Code:

A1

Abstract:

An exposure apparatus, wherein the pattern of a mask (M) is transferred onto a photosensitive substrate (P) by guiding a light flux emitted from a light source (1) to the mask, comprises an illumination optical system which is disposed in an optical path between the light source and the mask and illuminates the mask according to the light flux from the light source. The light source comprises a solid-state light source unit having a plurality of solid-state light sources so arranged that the luminance on the photosensitive substrate is 30 mW/cm² or higher.

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Inventors:

KOYAMA MOTOO (JP)
TANAKA MASASHI (JP)
KATO KAZUYUKI (JP)
NOBORU MICHIO (JP)

Application Number:

PCT/JP2003/014973

Publication Date:

June 10, 2004

Filing Date:

November 25, 2003

Export Citation:

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Assignee:

NIKON CORP (JP)
KOYAMA MOTOO (JP)
TANAKA MASASHI (JP)
KATO KAZUYUKI (JP)
NOBORU MICHIO (JP)

International Classes:

G02B19/00; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G02B19/00; G03F7/20

Foreign References:

JPH08334803A	1996-12-17
JP2002303988A	2002-10-18
JP2002318364A	2002-10-31
JP2001166497A	2001-06-22
JPH09179309A	1997-07-11
JP2004039871A	2004-02-05

Attorney, Agent or Firm:

Fujimoto, Yoshihiro (5F 6-1, Uchikanda 3-chom, Chiyoda-ku Tokyo, JP)

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